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New insight on the behavior of the irreversible adsorption and underpotential deposition of thallium on platinum (111) and vicinal surfaces in acid electrolytes

机译:acid在酸性电解质中铂(111)和邻近表面上lium的不可逆吸附和负电位沉积行为的新见解

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摘要

We report, for the first time, the electrochemical behavior of thallium irreversibly adsorbed on Pt (111) and platinum stepped surfaces composed of (111) terraces and monoatomic steps. Similar to the case of thallium UPD, the voltammograms obtained after thallium irreversible adsorption present three characteristic features. After a careful analysis of the effect of the thallium concentration, the concentration and nature of the anion of the supporting electrolyte and the pH of the solution on these voltammetric features, we have been able to ascribe these processes to Tl/Tl+ oxidation and anion adsorption on the Tl-modified surface. In addition, the results obtained with stepped surfaces, indicate that some of the features are clearly associated to the presence of (111) surface domains, and thus they could be used for the quantification of these sites.
机译:我们首次报道了不可逆地吸附在Pt(111)和由(111)梯阶和单原子台阶组成的铂台阶表面上的al的电化学行为。与UUPD的情况类似,th不可逆吸附后获得的伏安图具有三个特征。在仔细分析the浓度,支持电解质的阴离子浓度和性质以及溶液的pH对这些伏安特性的影响后,我们已经将这些过程归因于Tl / Tl +氧化和阴离子吸附在T1修饰的表面上。另外,用阶梯状表面获得的结果表明,某些特征显然与(111)表面域的存在相关,因此可以将它们用于这些位点的定量。

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